Wen-Wei Liao, PhD

2025

• Highly accurate assembly polishing with DeepPolisher

  Mastoras M, Asri M, Brambrink L, Hebbar P, Kolesnikov A, Cook D, Nattestad M, Lucas J, Won T, Chang P, Carroll A, Paten B, Shafin K, Consortium A, Tayoun A, Albracht D, Allen J, Alsheikh-Ali A, Andrews C, Antipov D, Antonacci-Fulton L, Asri M, Ayllon M, Balacco J, Belter E, Bender H, Blair A, Buonaiuto S, Bolognini D, Bonini K, Boucher C, Bourque G, Cao S, Carroll A, Mc Cartney A, Cechova M, Chang P, Chang X, Cheema J, Cheng H, Ciofi C, Cody S, Colonna V, Conwell H, Cook-Deegan R, Diekhans M, Diroma M, Doerr D, Dong Z, Durbin R, Ebler J, Eichler E, Eizenga J, Eskandar P, Ferro E, Fiston-Lavier A, Ford S, Ford W, Formenti G, Frankish A, Freeberg M, Fu Q, Fullerton S, Fulton R, Gao Y, Garcia G, Garcia O, Gardner J, Garg S, Garrison E, Garrison N, Garza J, Ghorbani M, Graves-Lindsay T, Green R, Groza C, Guarracino A, Gymrek M, Haggerty L, Hall I, Hansen N, Hashmi M, Haeussler M, Haussler D, Hebbar P, Heringer P, Hickey G, Hillaker T, Hossain S, Huang N, Hunt S, Hunt T, Jafarzadeh N, Jain N, Jarvis E, Jiang J, LoTempio J, Kenny E, Kim J, Koo B, Koren S, Kremitzki M, Langmead B, Zhuo X, Lawson H, Li D, Li H, Liao W, Lin J, Liu T, Logsdon G, Lorig-Roach R, Loucks H, Loveland J, Lu J, Lu S, Lucas J, Macias-Velasco J, Marin M, Marsico F, Makova K, Markovic C, Marschall T, Martin F, Mastoras M, Mayoud C, McNulty B, Medico J, Menendez J, Miga K, Minkina A, Mitchell M, Mohanty S, Mokrab Y, Monlong J, Moosa S, Moreno-Ochando A, Morishita S, Mudge J, Munson K, Mwaniki N, Nassir N, Natali C, Negi S, Ni L, Novak A, Owa C, Paez S, Paten B, Clawson H, Peano C, Phillippy A, Pickett B, Pignata L, Pisanti N, Porubsky D, Prins P, Radhakrishnan A, Raney B, Rautiainen M, Raveane A, Ren L, Rhie A, Salehi F, Sacco S, Schatz M, Scheinfeldt L, Sehgal A, Seligmann W, Shabani M, Shafin K, Shahatit S, Shemirani R, Shivakumar V, Sinha S, Sirén J, Smeds L, Solar S, Sollitto M, Soranzo N, Stergachis A, Suner M, Suzuki Y, Söylev A, Tierney J, Tomlinson C, Tricomi F, Uddin M, Ungaro M, Varki R, Villani F, Vollger M, Walenz B, Wang C, Wang L, Wang T, Wenger A, Whelan C, Xin Z, Xu Z, Ye K, Yoo D, Zhang W, Zhou Y, Violich I, Zunino G. Highly accurate assembly polishing with DeepPolisher. Genome Research 2025, 35: 1595-1608. PMID: 40389286, PMCID: PMC12212083, DOI: 10.1101/gr.280149.124.

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