2006
Nanofluidic Devices for Sensing and Flow Control
Karnik R, Castelino K, Duan C, Fan R, Yang P, Majumdar A. Nanofluidic Devices for Sensing and Flow Control. 2006, 161-167. DOI: 10.1115/icnmm2006-96156.Peer-Reviewed Original ResearchNanofluidic devicesBiomolecule sizeSurface chargeNanofluidic transistorGate voltageField-effect transistorsNetwork of nanochannelsMetal gate electrodesSilica nanotubesNanofluidic networksStandard lithographyBiomolecule chargesNanofluidic channelsFluidic channelsEffect transistorsNanochannel surfaceFabrication processGate electrodeNanochannelsCarrier concentrationTransistorsFlow controlElectrical conductance measurementsFluorescence imagingElectrostatic interactions
2004
Ion Transport in Nanochannels
Li D, Yue M, Karnik R, Majumdar A, Fan R, Yang P. Ion Transport in Nanochannels. 2004, 613-616. DOI: 10.1115/ht-fed2004-56717.Peer-Reviewed Original ResearchLow concentration solutionsElectric double layer thicknessNanofluidic devicesSi nanowire templatesSilica nanotube arraysChannel wall materialConcentration solutionsDouble layer thicknessSilica nanotubesBulk concentrationGlass substratesNanotube arraysNanowire templatesLayer thicknessChannel lengthInner diameterIon transportHigh concentration solutionSurface charge densityWall materialNanochannelsNanotubesIndividual nanotubesBulk solutionCharge density
2003
Design and Fabrication of Silica Nanotube Arrays and Nanofluidic Devices
Li D, Yue M, Majumdar A, Fan R, Wu Y, Yang P. Design and Fabrication of Silica Nanotube Arrays and Nanofluidic Devices. 2003, 635-638. DOI: 10.1115/imece2003-43982.Peer-Reviewed Original ResearchSilica nanotube arraysSilica nanotubesNanotube arraysSilicon nanowire templatesNanowire templatesSilicon coreVapor–LiquidDry etch processNanofluidic devicesDry oxidation processNanotubesSilica substrateSiO2 sheathChrome layerGate structureEpitaxial growthTube furnaceEtch processDiameter rangeWire coreM KCl solutionCurrent flowArrayOxidation processDevices