2025
Luminescence properties of homoepitaxial Mg-doped GaN under different doping concentrations and annealing atmospheres
Wu W, Shu Z, Wang X, Wang Y, Pan Y, Sun J, Gao X, Zheng S, Wang M, Zeng X, Xu K. Luminescence properties of homoepitaxial Mg-doped GaN under different doping concentrations and annealing atmospheres. Journal Of Luminescence 2025, 284: 121294. DOI: 10.1016/j.jlumin.2025.121294.Peer-Reviewed Original ResearchLuminescence propertiesDoping concentrationP-type GaN thin filmMg-doped GaNGaN thin filmsMg dopingRoom temperature PLAcceptor energy levelCm-3Defect statesEnergy levelsMgGa acceptorN2 annealingO2 annealingCL spectraMg doping concentrationAnnealing atmosphereFS substrateThin filmsLuminescenceDopingGaN.Low temperaturesAnnealingAcceptorOptical properties of Mg-implanted GaN grown on free-standing substrates
Wu W, Pan Y, Gao X, Wang X, Wei S, Sun J, Zeng X, Zheng S, Xu K. Optical properties of Mg-implanted GaN grown on free-standing substrates. Journal Of Physics D 2025, 58: 135101. DOI: 10.1088/1361-6463/ada8bb.Peer-Reviewed Original ResearchGaN:MgGaN thin filmsLuminescence bandThin filmsMetal organic chemical vapor depositionGreen luminescence bandBlue luminescence bandM-plane substrateLow-temperature PL spectraAcceptor energy levelChemical vapor depositionGaN free-standing substrateMg-doped GaNMg-implanted GaNUltraviolet luminescence peakPL spectraC-plane substratesLuminescence peakOptical propertiesEnergy levelsVapor depositionIon implantationAcceptorMgGa acceptorPhotoluminescence
2023
Epitaxial Growth of High-Quality GaN Films Based on Bilayer Graphene
Zhou J, Xu Y, Wang X, Wang Y, Yue L, Wang J, Cao B, Xu K. Epitaxial Growth of High-Quality GaN Films Based on Bilayer Graphene. 2023, 00: 161-164. DOI: 10.1109/sslchinaifws60785.2023.10399753.Peer-Reviewed Original ResearchGaN filmsAlN/sapphire templatesEpitaxial GaN thin filmsGrowth of GaN filmsGrowth of high-quality GaN filmsGaN thin filmsHigh-quality GaN filmsEpitaxial growthOptoelectronic devicesHigh-performance devicesNucleation layerGrapheneAlN/sapphireFlexible optoelectronic devicesThin filmsFilm formation processGaNFilm stressDislocation densitySurface roughnessFilmsFormation processEpitaxyGrowth conditionsBilayerDefect evolution in GaN thin film heterogeneously integrated with CMOS-compatible Si(100) substrate by ion-cutting technology
Shi H, Yi A, Ding J, Liu X, Qin Q, Yi J, Hu J, Wang M, Cai D, Wang J, Xu K, Mu F, Suga T, Heller R, Wang M, Zhou S, Xu W, Huang K, You T, Ou X. Defect evolution in GaN thin film heterogeneously integrated with CMOS-compatible Si(100) substrate by ion-cutting technology. Science China Information Sciences 2023, 66: 219403. DOI: 10.1007/s11432-022-3668-0.Peer-Reviewed Original Research
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